Low Temperature Plasma Physics. Fundamental Aspects And Applications

Plasma physics is a very active area of research located on the boundaries between physics, chemistry and materials science. Recent technological developments, e.g. in plasma etching or plasma deposition, have led to a revived interest in plasma physics and technology. This volume describes in detail fundamentals and applications of low-temperature plasma physics including newest achievements. An international team of authors presents most recent successes in our understanding of how plasmas behave and put a strong focus on the links between theory and experiment or technological process.